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AGR@ICN2 NanoFrazor Technology
NanoFrazor (thermal scanning probe) lithography uses a heatable tip that can pattern and simultaneously inspect nanostructures. NanoFrazor can pattern very high-resolution (< 10 nm half-pitch) nanostructures by locally evaporating resist materials. The structures are inspected by the cold tip before or during with the patterning, enabling stitching and markerless overlay with sub-5 nm accuracy. Thermal scanning probe lithography is compatible with all standard pattern transfer processes.

In addition to standard features offered by e-beam, NanoFrazor has several unique capabilities. Since no charged particles are involved in the patterning process, NanoFrazor is free from charging and proximity effect, it does not damage the sample material or implant charges in the dielectric layer. Such non-invasive lithography yields devices with superior performance. Another unique feature of the NanoFrazor is 3D/grayscale patterning capability. The in-situ imaging capability enables the implementation of feedback algorithms. As a result, NanoFrazor can pattern smooth grayscale structures with 1 nm vertical resolution in a straight-forward manner.

NanoFrazor can also be used for fabrication of superior devices from 2D materials: It can be used to shape the flakes with high precision; to make high-quality contacts on 2D materials; to induce precisely controlled local strain; to locally define the doping through absorption of charged defects from a controlled environment. NanoFrazor also has an integrated direct laser sublimation module for rapid patterning of coarse features such as electrodes and contact pads.

Jan 19, 2021 11:00 AM in Zurich

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